Virtual Seminar — "Turning Nucleation On and Off: Chemical Strategies for Precision Atomic Layer Deposition"
Wed, Oct 14
|Webinar
Dr. Stacey Bent
Time & Location
Oct 14, 2026, 11:00 a.m. – 12:00 p.m. EDT
Webinar
About the event
Interested in learning about how tuning surface chemistry, precursor structure, and process conditions can either enhance or inhibit atomic layer deposition (ALD) nucleation? The Carbon to Metal Coating Institute (C2MCI) invites you to join us for a virtual public seminar with guest Dr. Stacey Bent, featured as part of the C2MCI’s Virtual Seminar Series.
In this seminar, Dr. Stacey Bent will present an overview of her work on dielectric deposition onto 2D transition metal dichalcogenides using physisorption-assisted ALD and discuss the design of inhibitory layers that modify native surface reactivity to selectively block growth.
📍 Virtual Event (Zoom)
🕐 Wednesday, October 14 - 11am-12pm
Register today: https://bit.ly/3T6DCJS
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